Screen printed etching pastes or photolithography with standard wet etching chemistries are typically used to pattern transparent conducting films, including C3Nano’s ActiveGrid™ films.
C3Nano has also successfully employed UV lasers to pattern ActiveGrid™ films. Typically a 20W (355 nm wavelength) laser is used with a spot size of 25 µm and a patterning speed of 300 mm/sec.